NanoClear Technologies Secures Worldwide Exclusive License for Atomic Layer Polishing (ALP) from Caltech/JPL

Groundbreaking Surface Engineering Technology Moves from NASA's JPL to Commercial Applications

Groundbreaking Surface Engineering Technology Moves from NASA's JPL to Commercial Applications

NanoClear Technologies proudly announces that it has secured a worldwide exclusive license for Atomic Layer Polishing (ALP) from the California Institute of Technology (Caltech). ALP is a breakthrough smoothing technology capable of refining semiconductor materials such as Silicon Carbide (SiC), Gallium Nitride (GaN), Ruthenium, Silicon Dioxide (SiO2), and many others to an ultra-smooth finish of 0.2nm RMS or below.

Atomic Layer Polishing (ALP) was originally developed in the Microdevices Lab at NASA's Jet Propulsion Laboratory for use in space applications. JPL is managed for NASA by Caltech.

Revolutionary Non-Contact Process

Unlike traditional Chemical Mechanical Polishing (CMP), which relies on physical contact, slurry, and pads, ALP is a revolutionary non-contact process. This key advantage allows it to eliminate common defects and subsurface damage associated with CMP, offering an unprecedented level of precision and material integrity.

Moreover, ALP's capabilities extend beyond planar surfaces, enabling the smoothing of complex three-dimensional structures such as damascene trenches and other semiconductor features that CMP cannot effectively process.

"This exclusive agreement with Caltech/JPL marks a significant milestone in the commercialization of ALP, positioning NanoClear Technologies at the forefront of next-generation semiconductor manufacturing," said John Doricko, Sr Vice President at NanoClear Technologies. "With ALP, we can deliver unparalleled surface quality, improved device performance, and increased manufacturing efficiency across a broad range of applications."

From Research Labs to Industrial Applications

Caltech/JPL has a long-standing tradition of fostering innovation and supporting the commercialization of transformative technologies. By licensing Atomic Layer Polishing (ALP) to NanoClear Technologies, Caltech/JPL is ensuring that this cutting-edge advancement moves from research labs to real-world industrial applications, benefiting sectors such as:

  • Power electronics
  • Advanced computing
  • Optoelectronics
  • Semiconductor manufacturing

NanoClear Technologies is now actively engaging with industry leaders to integrate ALP into semiconductor manufacturing processes, unlocking new possibilities in precision polishing and device fabrication.

For more information on NanoClear Technologies and Atomic Layer Polishing (ALP), please visit www.ncttechnologies.com or contact [email protected].

About NanoClear Technologies: NanoClear Technologies is at the forefront of surface engineering innovation, specializing in atomic-level precision for semiconductor and advanced materials applications. Our proprietary Atomic Layer Polish® (ALP) technology delivers unprecedented surface quality while eliminating the defects, waste, and limitations of traditional polishing methods.

Keywords: Atomic Layer Polishing, ALP, semiconductor manufacturing, Caltech, JPL, NASA, surface engineering, nanotechnology, Chemical Mechanical Polishing, CMP alternative

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